Displacement Talbot Lithography for nano-engineering of III-nitride materials

Pierre-Marie Coulon, Benjamin Damilano, Blandine Alloing, Pierre Chausse, Sebastian Walde, Johannes Enslin, Robert Armstrong, Stéphane Vézian, Sylvia Hagedorn, Tim Wernicke, Jesús Zúñiga-Pérez, Markus Weyers, Michael Kneissl, Philip Shields

Research output: Contribution to journalArticle

Original languageEnglish
JournalMicrosystems & Nanoengineering
Publication statusAccepted/In press - 23 Aug 2019

Cite this

Displacement Talbot Lithography for nano-engineering of III-nitride materials. / Coulon, Pierre-Marie; Damilano, Benjamin; Alloing, Blandine; Chausse, Pierre; Walde, Sebastian; Enslin, Johannes; Armstrong, Robert; Vézian, Stéphane; Hagedorn, Sylvia; Wernicke, Tim; Zúñiga-Pérez, Jesús; Weyers, Markus; Kneissl, Michael; Shields, Philip.

In: Microsystems & Nanoengineering, 23.08.2019.

Research output: Contribution to journalArticle

Coulon, P-M, Damilano, B, Alloing, B, Chausse, P, Walde, S, Enslin, J, Armstrong, R, Vézian, S, Hagedorn, S, Wernicke, T, Zúñiga-Pérez, J, Weyers, M, Kneissl, M & Shields, P 2019, 'Displacement Talbot Lithography for nano-engineering of III-nitride materials', Microsystems & Nanoengineering.
Coulon, Pierre-Marie ; Damilano, Benjamin ; Alloing, Blandine ; Chausse, Pierre ; Walde, Sebastian ; Enslin, Johannes ; Armstrong, Robert ; Vézian, Stéphane ; Hagedorn, Sylvia ; Wernicke, Tim ; Zúñiga-Pérez, Jesús ; Weyers, Markus ; Kneissl, Michael ; Shields, Philip. / Displacement Talbot Lithography for nano-engineering of III-nitride materials. In: Microsystems & Nanoengineering. 2019.
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AU - Alloing, Blandine

AU - Chausse, Pierre

AU - Walde, Sebastian

AU - Enslin, Johannes

AU - Armstrong, Robert

AU - Vézian, Stéphane

AU - Hagedorn, Sylvia

AU - Wernicke, Tim

AU - Zúñiga-Pérez, Jesús

AU - Weyers, Markus

AU - Kneissl, Michael

AU - Shields, Philip

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