Cis-bis(isothiocyanato)-bis(2,2′-bipyridyl-4,4′dicarboxylato)-Ru(II) (N719) dark-reactivity when bound to fluorine-doped tin oxide (FTO) or titanium dioxide (TiO2) surfaces

Alberto Fattori; Laurence M Peter; Stephen R Belding; Richard G Compton; Frank Marken

doi:10.1016/j.jelechem.2010.01.004

Cis-bis(isothiocyanato)-bis(2,2′-bipyridyl-4,4′dicarboxylato)-Ru(II) (N719) dark-reactivity when bound to fluorine-doped tin oxide (FTO) or titanium dioxide (TiO2) surfaces

Alberto Fattori, Laurence M Peter, Stephen R Belding, Richard G Compton, Frank Marken

Department of Chemistry

Research output: Contribution to journal › Article › peer-review

17 Citations (SciVal)

Original language	English
Pages (from-to)	61-67
Number of pages	7
Journal	Journal of Electroanalytical Chemistry
Volume	640
Issue number	1-2
DOIs	https://doi.org/10.1016/j.jelechem.2010.01.004
Publication status	Published - Mar 2010

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10.1016/j.jelechem.2010.01.004

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Cis-bis(isothiocyanato)-bis(2,2′-bipyridyl-4,4′dicarboxylato)-Ru(II) (N719) dark-reactivity when bound to fluorine-doped tin oxide (FTO) or titanium dioxide (TiO2) surfaces. / Fattori, Alberto; Peter, Laurence M; Belding, Stephen R et al.
In: Journal of Electroanalytical Chemistry, Vol. 640, No. 1-2, 03.2010, p. 61-67.

Research output: Contribution to journal › Article › peer-review

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title = "Cis-bis(isothiocyanato)-bis(2,2′-bipyridyl-4,4′dicarboxylato)-Ru(II) (N719) dark-reactivity when bound to fluorine-doped tin oxide (FTO) or titanium dioxide (TiO2) surfaces",

author = "Alberto Fattori and Peter, {Laurence M} and Belding, {Stephen R} and Compton, {Richard G} and Frank Marken",

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AU - Compton, Richard G

AU - Marken, Frank

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Cis-bis(isothiocyanato)-bis(2,2′-bipyridyl-4,4′dicarboxylato)-Ru(II) (N719) dark-reactivity when bound to fluorine-doped tin oxide (FTO) or titanium dioxide (TiO2) surfaces

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Cis-bis(isothiocyanato)-bis(2,2′-bipyridyl-4,4′dicarboxylato)-Ru(II) (N719) dark-reactivity when bound to fluorine-doped tin oxide (FTO) or titanium dioxide (TiO2) surfaces

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ELECTRO-OPTIC PROPERTIES OF TRANSITION-METAL COMPLEX FILMS O N NANOCRYSTALLINE SEMICONDUCTOR SUPPORTS:

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