Chemical vapour deposition of group Vb metal phosphide thin films

C S Blackman, C J Carmalt, S A O'Neill, I P Parkin, K C Molloy, L Apostolico

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

The atmospheric pressure chemical vapour deposition (APCVD) reaction of VCl4 or VOCl3 with cyclohexylphosphine at substrate temperatures of 600 degreesC deposits thin films of amorphous vanadium phosphide. The films are black - gold, hard, chemically resistant and conductive. The APCVD reaction of MCl5 (where M = Nb or Ta) with cyclohexylphosphine at 500 - 600 degreesC deposits films of crystalline beta-MP and at 400 degreesC - 450 degreesC amorphous films of stoichiometry MP are formed. The MP films are metallic, conductive, adherent and chemically resistant.
Original languageEnglish
Pages (from-to)1930-1935
Number of pages6
JournalJournal of Materials Chemistry
Volume13
Issue number8
DOIs
Publication statusPublished - 2003

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Atmospheric pressure
Chemical vapor deposition
Deposits
Metals
Thin films
Vanadium
Metallic films
Amorphous films
Stoichiometry
Gold
Crystalline materials
Substrates
Temperature
Black-Gold

Cite this

Blackman, C. S., Carmalt, C. J., O'Neill, S. A., Parkin, I. P., Molloy, K. C., & Apostolico, L. (2003). Chemical vapour deposition of group Vb metal phosphide thin films. Journal of Materials Chemistry, 13(8), 1930-1935. https://doi.org/10.1039/b304084b

Chemical vapour deposition of group Vb metal phosphide thin films. / Blackman, C S; Carmalt, C J; O'Neill, S A; Parkin, I P; Molloy, K C; Apostolico, L.

In: Journal of Materials Chemistry, Vol. 13, No. 8, 2003, p. 1930-1935.

Research output: Contribution to journalArticle

Blackman, CS, Carmalt, CJ, O'Neill, SA, Parkin, IP, Molloy, KC & Apostolico, L 2003, 'Chemical vapour deposition of group Vb metal phosphide thin films', Journal of Materials Chemistry, vol. 13, no. 8, pp. 1930-1935. https://doi.org/10.1039/b304084b
Blackman CS, Carmalt CJ, O'Neill SA, Parkin IP, Molloy KC, Apostolico L. Chemical vapour deposition of group Vb metal phosphide thin films. Journal of Materials Chemistry. 2003;13(8):1930-1935. https://doi.org/10.1039/b304084b
Blackman, C S ; Carmalt, C J ; O'Neill, S A ; Parkin, I P ; Molloy, K C ; Apostolico, L. / Chemical vapour deposition of group Vb metal phosphide thin films. In: Journal of Materials Chemistry. 2003 ; Vol. 13, No. 8. pp. 1930-1935.
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