Chemical vapour deposition of crystalline thin films of tantalum phosphide

C S Blackman, C J Carmalt, I P Parkin, S A O'Neill, K C Molloy, L Apostolico

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Tantalum phosphide coatings were prepared by chemical vapour deposition reaction of TaCl5 and PH2Cy at 350-500 degreesC. The films are hard, stable to corrosive environments and show reflection properties in the infrared. (C) 2002 Elsevier Science B.V. All rights reserved.
Original languageEnglish
Pages (from-to)2634-2636
Number of pages3
JournalMaterials Letters
Volume57
Issue number18
DOIs
Publication statusPublished - 2003

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