Chemical vapour deposition of crystalline thin films of tantalum phosphide

C S Blackman; C J Carmalt; I P Parkin; S A O'Neill; K C Molloy; L Apostolico

doi:10.1016/s0167-577x(02)01341-1

Chemical vapour deposition of crystalline thin films of tantalum phosphide

C S Blackman, C J Carmalt, I P Parkin, S A O'Neill, K C Molloy, L Apostolico

Department of Chemistry

Research output: Contribution to journal › Article › peer-review

9 Citations (SciVal)

Abstract

Tantalum phosphide coatings were prepared by chemical vapour deposition reaction of TaCl5 and PH2Cy at 350-500 degreesC. The films are hard, stable to corrosive environments and show reflection properties in the infrared. (C) 2002 Elsevier Science B.V. All rights reserved.

Original language	English
Pages (from-to)	2634-2636
Number of pages	3
Journal	Materials Letters
Volume	57
Issue number	18
DOIs	https://doi.org/10.1016/s0167-577x(02)01341-1
Publication status	Published - 2003

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ID number: ISI:000182776500003

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title = "Chemical vapour deposition of crystalline thin films of tantalum phosphide",

abstract = "Tantalum phosphide coatings were prepared by chemical vapour deposition reaction of TaCl5 and PH2Cy at 350-500 degreesC. The films are hard, stable to corrosive environments and show reflection properties in the infrared. (C) 2002 Elsevier Science B.V. All rights reserved.",

author = "Blackman, {C S} and Carmalt, {C J} and Parkin, {I P} and O'Neill, {S A} and Molloy, {K C} and L Apostolico",

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doi = "10.1016/s0167-577x(02)01341-1",

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volume = "57",

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T1 - Chemical vapour deposition of crystalline thin films of tantalum phosphide

AU - Blackman, C S

AU - Carmalt, C J

AU - Parkin, I P

AU - O'Neill, S A

AU - Molloy, K C

AU - Apostolico, L

N1 - ID number: ISI:000182776500003

PY - 2003

Y1 - 2003

N2 - Tantalum phosphide coatings were prepared by chemical vapour deposition reaction of TaCl5 and PH2Cy at 350-500 degreesC. The films are hard, stable to corrosive environments and show reflection properties in the infrared. (C) 2002 Elsevier Science B.V. All rights reserved.

AB - Tantalum phosphide coatings were prepared by chemical vapour deposition reaction of TaCl5 and PH2Cy at 350-500 degreesC. The films are hard, stable to corrosive environments and show reflection properties in the infrared. (C) 2002 Elsevier Science B.V. All rights reserved.

U2 - 10.1016/s0167-577x(02)01341-1

DO - 10.1016/s0167-577x(02)01341-1

M3 - Article

SN - 0167-577X

VL - 57

SP - 2634

EP - 2636

JO - Materials Letters

JF - Materials Letters

IS - 18

ER -

Chemical vapour deposition of crystalline thin films of tantalum phosphide

Abstract

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