Characterization of the interface region during the agglomeration of silicon nanocrystals in silicon dioxide

X D Pi, P G Coleman, R Harding, G Davies, R M Gwilliam

Research output: Contribution to journalArticlepeer-review

16 Citations (SciVal)
Original languageEnglish
Pages (from-to)8155-8159
Number of pages5
JournalJournal of Applied Physics
Volume95
Issue number12
Publication statusPublished - 2004

Bibliographical note

ID number: ISI:000221843400093

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