Abstract
In this work we report on the fabrication of inductively coupled plasma (ICP) etched, diode-type, bulk molybdenum field emitter arrays. Emitter etching conditions as a function of etch mask geometry and process conditions were systematically investigated. For optimized uniformity, aspect ratios of >10 were achieved, with 25.5 nm-radius tips realised for masks consisting of aperture arrays some 4.45 μm in diameter and whose field electron emission performance has been herein assessed.
| Original language | English |
|---|---|
| Pages (from-to) | 33152-33157 |
| Journal | Physical Chemistry Chemical Physics |
| Volume | 18 |
| Issue number | 48 |
| DOIs | |
| Publication status | Published - 22 Nov 2016 |
ASJC Scopus subject areas
- General Physics and Astronomy
- Physical and Theoretical Chemistry
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