Bulk molybdenum field emitters by inductively coupled plasma etching

Ningli Zhu, Matthew Cole, William I. Milne, Jing Chen

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

In this work we report on the fabrication of inductively coupled plasma (ICP) etched, diode-type, bulk molybdenum field emitter arrays. Emitter etching conditions as a function of etch mask geometry and process conditions were systematically investigated. For optimized uniformity, aspect ratios of >10 were achieved, with 25.5 nm-radius tips realised for masks consisting of aperture arrays some 4.45 μm in diameter and whose field electron emission performance has been herein assessed.

Original languageEnglish
Pages (from-to)33152-33157
JournalPhysical Chemistry Chemical Physics
Volume18
Issue number48
DOIs
Publication statusPublished - 22 Nov 2016

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

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