Bulk molybdenum field emitters by inductively coupled plasma etching

Ningli Zhu; Matthew Cole; William I. Milne; Jing Chen

doi:10.1039/C6CP06340C

Bulk molybdenum field emitters by inductively coupled plasma etching

Ningli Zhu, Matthew Cole, William I. Milne, Jing Chen

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8 Citations (SciVal)

Abstract

In this work we report on the fabrication of inductively coupled plasma (ICP) etched, diode-type, bulk molybdenum field emitter arrays. Emitter etching conditions as a function of etch mask geometry and process conditions were systematically investigated. For optimized uniformity, aspect ratios of >10 were achieved, with 25.5 nm-radius tips realised for masks consisting of aperture arrays some 4.45 μm in diameter and whose field electron emission performance has been herein assessed.

Original language	English
Pages (from-to)	33152-33157
Journal	Physical Chemistry Chemical Physics
Volume	18
Issue number	48
DOIs	https://doi.org/10.1039/C6CP06340C
Publication status	Published - 22 Nov 2016

ASJC Scopus subject areas

General Physics and Astronomy
Physical and Theoretical Chemistry

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10.1039/C6CP06340C

https://www.repository.cam.ac.uk/handle/1810/261598

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title = "Bulk molybdenum field emitters by inductively coupled plasma etching",

abstract = "In this work we report on the fabrication of inductively coupled plasma (ICP) etched, diode-type, bulk molybdenum field emitter arrays. Emitter etching conditions as a function of etch mask geometry and process conditions were systematically investigated. For optimized uniformity, aspect ratios of >10 were achieved, with 25.5 nm-radius tips realised for masks consisting of aperture arrays some 4.45 μm in diameter and whose field electron emission performance has been herein assessed.",

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AU - Zhu, Ningli

AU - Cole, Matthew

AU - Milne, William I.

AU - Chen, Jing

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ER -

Bulk molybdenum field emitters by inductively coupled plasma etching

Abstract

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