Bulk molybdenum field emitters by inductively coupled plasma etching

Ningli Zhu, Matthew Cole, William I. Milne, Jing Chen

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

In this work we report on the fabrication of inductively coupled plasma (ICP) etched, diode-type, bulk molybdenum field emitter arrays. Emitter etching conditions as a function of etch mask geometry and process conditions were systematically investigated. For optimized uniformity, aspect ratios of >10 were achieved, with 25.5 nm-radius tips realised for masks consisting of aperture arrays some 4.45 μm in diameter and whose field electron emission performance has been herein assessed.

Original languageEnglish
Pages (from-to)33152-33157
JournalPhysical Chemistry Chemical Physics
Volume18
Issue number48
DOIs
Publication statusPublished - 22 Nov 2016

Fingerprint

Molybdenum
Plasma etching
Inductively coupled plasma
plasma etching
molybdenum
Plasma diodes
Masks
emitters
masks
plasma diodes
Electron emission
electron emission
aspect ratio
Aspect ratio
field emission
Etching
apertures
etching
Fabrication
fabrication

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

Cite this

Bulk molybdenum field emitters by inductively coupled plasma etching. / Zhu, Ningli; Cole, Matthew; Milne, William I.; Chen, Jing.

In: Physical Chemistry Chemical Physics , Vol. 18, No. 48, 22.11.2016, p. 33152-33157.

Research output: Contribution to journalArticle

Zhu, Ningli ; Cole, Matthew ; Milne, William I. ; Chen, Jing. / Bulk molybdenum field emitters by inductively coupled plasma etching. In: Physical Chemistry Chemical Physics . 2016 ; Vol. 18, No. 48. pp. 33152-33157.
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