Broadband moth-eye antireflection coatings fabricated by low-cost nanoimprinting

Q Chen, G Hubbard, Philip A Shields, Chaowang Liu, Duncan W E Allsopp, Wang N Wang, S Abbott

Research output: Contribution to journalArticlepeer-review

213 Citations (SciVal)


Subwavelength scale antireflection moth-eye structures in silicon were fabricated by a wafer-scale nanoimprint technique and demonstrated an average reflection of 1% in the spectral range from 400 to 1000 nm at normal incidence. An excellent antireflection property out to large incident angles is shown with the average reflection below 8% at 60 degrees. Pyramid array gave an almost constant average reflection of about 10% for an incident angle up to 45 degrees and concave-wall column array produced an approximately linear relation between the average reflection and the incident angles. The technique is promising for improving conversion efficiencies of silicon solar cells.
Original languageEnglish
Article number263118
Number of pages3
JournalApplied Physics Letters
Issue number26
Publication statusPublished - 29 Jun 2009


  • elemental semiconductors
  • antireflection coatings
  • solar cells
  • nanolithography
  • silicon


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