Atmospheric-pressure chemical vapor deposition of group IVb metal phosphide thin films from tetrakisdimethylamidometal complexes and cyclohexylphosphine

C S Blackman, C J Carmalt, S A O'Neill, I P Parkin, L Apostolico, K C Molloy

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

The dual-source atmospheric-pressure chemical vapor deposition of group IVb metal phosphide films from tetrakisdimethylamido(metal) and cyclohexylphosphine precursors is presented. Deposition took place at low temperatures (
Original languageEnglish
Pages (from-to)1120-1125
Number of pages6
JournalChemistry of Materials
Volume16
Issue number6
Publication statusPublished - 2004

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