AACVD of WO3 thin films from W(O)(OPri)(3)[O(CH2)(n)NMe2] (n=2, 3)

K C Molloy, P A Williams

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

Monomeric tungsten oxo-aminoalkoxides W(O)(OPri)(3)(L)[L = O(CH2)(n)NMe2; n = 2 (dmae, 1) and 3 (dmap, 2)] were synthesized by alcohol exchange with [W(O)(OPri)(4)](2) and characterized spectroscopically. 1, 2 and [W(O)(OPri)(4)](2) were used as precursors for the aerosol-assisted chemical vapour deposition Of WO3 thin films, which were characterized by glancing angle X-ray diffraction, SEM and transmission-reflectance measurements.
Original languageEnglish
Pages (from-to)676-683
Number of pages8
JournalApplied Organometallic Chemistry
Volume22
Issue number12
DOIs
Publication statusPublished - 2008

Fingerprint

Tungsten
Reflectometers
Aerosols
Chemical vapor deposition
Alcohols
X ray diffraction
Thin films
Scanning electron microscopy

Keywords

  • single-source precursor
  • thin film
  • tungsten oxide
  • alkoxide
  • CVD

Cite this

AACVD of WO3 thin films from W(O)(OPri)(3)[O(CH2)(n)NMe2] (n=2, 3). / Molloy, K C; Williams, P A.

In: Applied Organometallic Chemistry, Vol. 22, No. 12, 2008, p. 676-683.

Research output: Contribution to journalArticle

Molloy, K C ; Williams, P A. / AACVD of WO3 thin films from W(O)(OPri)(3)[O(CH2)(n)NMe2] (n=2, 3). In: Applied Organometallic Chemistry. 2008 ; Vol. 22, No. 12. pp. 676-683.
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