Abstract
| Original language | English |
|---|---|
| Pages (from-to) | 2515-2528 |
| Number of pages | 14 |
| Journal | International Journal of Production Research |
| Volume | 38 |
| Issue number | 11 |
| DOIs | |
| Publication status | Published - 2000 |
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A systems approach to photolithography process optimization in an electronics manufacturing environment. / Doniavi, A; Mileham, A. R.; Newnes, L. B.
In: International Journal of Production Research, Vol. 38, No. 11, 2000, p. 2515-2528.Research output: Contribution to journal › Article
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TY - JOUR
T1 - A systems approach to photolithography process optimization in an electronics manufacturing environment
AU - Doniavi, A
AU - Mileham, A. R.
AU - Newnes, L. B.
PY - 2000
Y1 - 2000
N2 - There are many complex problems in the optimization of an electronics manufacturing environment, and it is the view of the authors that these problems should not be solved and optimized in isolation, but analysed in the framework of a system. A systems approach offers an overall approach for solving problems, and optimizing the whole of the system as well as discrete subsystems. The research introduced in this paper integrates several techniques, namely: Integrated computer aided manufacturing DEFinition (IDEF), and experimental design and response surface methods for the analysis, control and optimization of electronic manufacturing processes. Electronics manufacturing includes three major processes; Printed Circuit Board (PCB) manufacturing, semiconductor device manufacturing and electronics assembly. This paper describes a novel generic systematic methodology that has been used to create a model to optimize the photolithography process in PCB manufacture. For this, photolithography has been considered as a whole system made up of several sub-systems. This is shown in the process map for PCBs that focuses on photolithography and its subprocesses. A model of the manufacturing process is then given with the results of this being validated using an industrial study. Optimized settings for processing equipment are given resulting in an increase in process yield within industry.
AB - There are many complex problems in the optimization of an electronics manufacturing environment, and it is the view of the authors that these problems should not be solved and optimized in isolation, but analysed in the framework of a system. A systems approach offers an overall approach for solving problems, and optimizing the whole of the system as well as discrete subsystems. The research introduced in this paper integrates several techniques, namely: Integrated computer aided manufacturing DEFinition (IDEF), and experimental design and response surface methods for the analysis, control and optimization of electronic manufacturing processes. Electronics manufacturing includes three major processes; Printed Circuit Board (PCB) manufacturing, semiconductor device manufacturing and electronics assembly. This paper describes a novel generic systematic methodology that has been used to create a model to optimize the photolithography process in PCB manufacture. For this, photolithography has been considered as a whole system made up of several sub-systems. This is shown in the process map for PCBs that focuses on photolithography and its subprocesses. A model of the manufacturing process is then given with the results of this being validated using an industrial study. Optimized settings for processing equipment are given resulting in an increase in process yield within industry.
UR - http://dx.doi.org/10.1080/00207540050031896
U2 - 10.1080/00207540050031896
DO - 10.1080/00207540050031896
M3 - Article
VL - 38
SP - 2515
EP - 2528
JO - International Journal of Production Research
JF - International Journal of Production Research
SN - 0020-7543
IS - 11
ER -