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Engineering
Cleanroom
33%
Computer Aided Design
33%
Domain Wall
100%
Dry Etching
33%
Electron Optical Lithography
100%
Field Emission
33%
Lithography
66%
Process Design
33%
Resistance Heating
33%
Spin Transfer
66%
Spin transfer torque
100%
Supporting Process
66%
Thin film deposition
33%
Training Expert
33%
UK
33%
Social Sciences
Academic Institution
100%
Computer Aided Design
100%
Hardware
100%
Scanning Electron Microscopy
100%
Scientists
100%
Technical Cooperation
100%
UK
100%
Material Science
Density
33%
Domain Wall
100%
Dry Etching
20%
Joule Heating
33%
Lithography
100%
Resistance Heating
33%
Scanning Electron Microscopy
20%
Thin Film Deposition
20%