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Research Output

Displacement Talbot Lithography for nano-engineering of III-nitride materials

Coulon, P-M., Damilano, B., Alloing, B., Chausse, P., Walde, S., Enslin, J., Armstrong, R., Vézian, S., Hagedorn, S., Wernicke, T., Zúñiga-Pérez, J., Weyers, M., Kneissl, M. & Shields, P., 2 Dec 2019, In : Microsystems & Nanoengineering. 5, 52.

Research output: Contribution to journalArticle

Open Access
2 Citations (Scopus)