Raith Elphy Plus Electron Beam Lithography

    Facility/equipment: Equipment

    • LocationShow on map

      NANOFAB LAB University of Bath Claverton Down Bath BA2 7AY

      UK United Kingdom

    Equipments Details

    Description

    Electron Beam Lithography System: Accelerating voltages 0.5 - 30 kV. 50 by 50 mm laser interferometric stage capable of writing over 50 mm wafers with < 80 nm accuracy. Capable of 20 nm line width.

    Details

    NameMake: Hitachi; Model: S 4300
    Acquisition date6/02/01

    Equipment taxonomy

    • Electron Beam

    User-defined keywords

    • Electron Beam Lithography

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