Raith Elphy Plus Electron Beam Lithography

    Facility/equipment: Equipment

    • LocationShow on map

      NANOFAB LAB University of Bath Claverton Down Bath BA2 7AY

      UK United Kingdom

    Equipments Details


    Electron Beam Lithography System: Accelerating voltages 0.5 - 30 kV. 50 by 50 mm laser interferometric stage capable of writing over 50 mm wafers with < 80 nm accuracy. Capable of 20 nm line width.


    NameMake: Hitachi; Model: S 4300
    Acquisition date6/02/01

    Equipment taxonomy

    • Electron Beam

    User-defined keywords

    • Electron Beam Lithography


    Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.