Plasmapro System 100 Cobra

Department of Electronic & Electrical Engineering

Facility/equipment: Equipment

LocationShow on map
3 W ANNEX 2.5 Dept of Electronic and Electrical Engineering University of Bath Claverton Down Bath BA2 7AY
UK United Kingdom

Description

ICP etching system: it utilises a high-density inductively coupled plasma to achieve fast etch rates.

Details

Name	Make: ADIXEN; Model: ADP122P
Acquisition date	3/02/12

Equipment taxonomy

Plasma

Contact information

Emails	[email protected]

1 Article

Creation of regular arrays of faceted AlN nanostructures via a combined top-down, bottom-up approach
Armstrong, R., Coulon, P. M., Bozinakis, P., Martin, R. W. & Shields, P. A., 15 Oct 2020, In: Journal of Crystal Growth. 548, 125824.
Research output: Contribution to journal › Article › peer-review

Open Access
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6 Citations (SciVal)

272 Downloads (Pure)