PhableR 100M Displacement Talbot Lithography

    Facility/equipment: Equipment

    • Location

      University of Bath Claverton Down Bath BA2 7AY

      UK United Kingdom

    Description

    PhableR 100M system from EULITHA AG. It is capable of the non-contact, submicron patterning of periodic patterns on areas up to 100 mm diameter.The theoretical resolution limit is a periodic pitch of approximately 200 nm, but the guaranteed pitch is 300 nm. The maximum pitch is approx. 4 microns. High-aspect ratio resist features are achievable and the machine also has an alignment capability.