Equipments Details
Description
It is capable of the non-contact, submicron patterning of periodic patterns on areas up to 100 mm diameter.The theoretical resolution limit is a periodic pitch of approximately 200 nm, but the guaranteed pitch is 300 nm. The maximum pitch is approx. 4 microns. High-aspect ratio resist features are achievable and the machine also has an alignment capability.
Details
| Name | Make: Eulitha AG; Model: PhableR 100M |
|---|---|
| Acquisition date | 1/09/15 |
Equipment taxonomy
- Optical
User-defined keywords
- Sub-micron lithography
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