Phable 100M Talbot Displacement Lithography

    Facility/equipment: Equipment

    • LocationShow on map

      NANOFAB LAB University of Bath Claverton Down Bath BA2 7AY

      UK United Kingdom

    Equipments Details


    It is capable of the non-contact, submicron patterning of periodic patterns on areas up to 100 mm diameter.The theoretical resolution limit is a periodic pitch of approximately 200 nm, but the guaranteed pitch is 300 nm. The maximum pitch is approx. 4 microns. High-aspect ratio resist features are achievable and the machine also has an alignment capability.


    NameMake: Eulitha AG; Model: PhableR 100M
    Acquisition date1/09/15

    Equipment taxonomy

    • Optical

    User-defined keywords

    • Sub-micron lithography


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