Oxford Plasma LAB 80 Plus for RIE and ICP etching

    Department of Physics

    Facility/equipment: Equipment

    • Location

      University of Bath Claverton Down Bath BA2 7AY

      UK United Kingdom

    Description

    Plasma dry etching with the following gases: CHF3, SF6, Ar, O2, SiCl4, Cl2, H2, CH4

    Contact information

    Phone01225 386956
    Emailsnanofab@bath.ac.uk
    LinksWebsite

    Terms of loan/booking

    Available for loan - internal and external

    Contact Stephen Wedge for details of costs.