OIPT Plasma Pro100 RIE/ICP

    Facility/equipment: Equipment

    • LocationShow on map

      NANOFAB LAB University of Bath Claverton Down Bath BA2 7AY

      UK United Kingdom

    Equipments Details


    Reactive Ion/Inductively Coupled Plasma Etcher. 4" wafer load-locck system. Etch gases available: O2, Ar, CHF3, SiCl4, Cl2, BCl3, SF6


    NameMake: Oxford Instruments Plasma Technology; Model: Plasma Pro 100

    Equipment taxonomy

    • Plasma
    • Reactive Ion

    User-defined keywords

    • RIE/ICP Etching


    Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.