Direct Laser Writer: Maximum substrate of 4" wafer or 100 mm by 100 mm mask blank. 375 nm laser source for wide range of resists. Resolution of 1 um line-width. CAD formats of CIF, GDSII or BMP.
|Name||Make: HEIDELBERG INSTRUMENTS; Model: MPG101|
- Laser (Direct-Write)
- Non-contact photo-lithography
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