Description
Capabilities: maskless lithography with sub-micron resolution, substrates up to 125 x 125 mm², 375 nm laser source for exposure of standard and UV resists such as SU-8, vector and raster exposure mode, 3D exposure mode available.
Heidelberg Instruments μPG 101 Direct Laser Writer
Facility/equipment: Equipment
- Location
University of Bath Claverton Down Bath BA2 7AY
UK United Kingdom