Heidelberg Instruments μPG 101 Direct Laser Writer

    Facility/equipment: Equipment

    • Location

      University of Bath Claverton Down Bath BA2 7AY

      UK United Kingdom

    Equipments Details


    Capabilities: maskless lithography with sub-micron resolution, substrates up to 125 x 125 mm², 375 nm laser source for exposure of standard and UV resists such as SU-8, vector and raster exposure mode, 3D exposure mode available.


    Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.