EVG 620 NanoImprint Lithography

    Facility/equipment: Equipment

    • LocationShow on map

      NANOFAB LAB University of Bath Claverton Down Bath BA2 7AY

      UK United Kingdom

    Equipments Details


    Nano Imprinting System: Capable of imprinting areas from 10 by 10 mm to 150 mm wafers. Accuracy guaranteed dwon to 50 nm. Suitable for a range of rigid substrates such as Si and quartz.


    NameMake: Oxford Instruments Plasma Technology; Model: Plasma Pro 100
    Acquisition date1/01/11

    Equipment taxonomy

    • Optical

    User-defined keywords

    • Nanoscale lithography


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