Research output per year
Research output per year
Equipments Details
Description
Nano Imprinting System: Capable of imprinting areas from 10 by 10 mm to 150 mm wafers. Accuracy guaranteed dwon to 50 nm. Suitable for a range of rigid substrates such as Si and quartz.
Details
| Name | Make: Oxford Instruments Plasma Technology; Model: Plasma Pro 100 |
|---|---|
| Acquisition date | 1/01/11 |
Equipment taxonomy
- Optical
User-defined keywords
- Nanoscale lithography
Fingerprint
Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.
Research output
- 3 Article
-
Creation of regular arrays of faceted AlN nanostructures via a combined top-down, bottom-up approach
Armstrong, R., Coulon, P. M., Bozinakis, P., Martin, R. W. & Shields, P. A., 15 Oct 2020, In: Journal of Crystal Growth. 548, 125824.Research output: Contribution to journal › Article › peer-review
Open AccessFile5 Citations (SciVal)233 Downloads (Pure) -
Nano-Imprinting of Highly Ordered Nano-Pillars of Lithium Niobate (LiNbO3)
Lewis, R. W. C., Allsopp, D. W. E., Shields, P., Šatka, A., Yu, S., Topolov, V. Y. & Bowen, C. R., 1 Jan 2012, In: Ferroelectrics. 429, 1, p. 62-68 7 p.Research output: Contribution to journal › Article › peer-review
Open AccessFile10 Citations (SciVal)294 Downloads (Pure) -
Nanoimprint lithography resist profile inversion for lift-off applications
Shields, P. A. & Allsopp, D. W. E., Sept 2011, In: Microelectronic Engineering. 88, 9, p. 3011-3014 4 p.Research output: Contribution to journal › Article › peer-review
Open AccessFile28 Citations (SciVal)260 Downloads (Pure)