This dataset contains scanning electron microscopy (SEM) images and Catodoluminescence (CL) measurements carried out on AlN nanorod. The samples were fabricated via a hybrid top-down/bottom up approach. Displacement Talbot Lithography is used to fabricate Au/Ni metal dots to act as a hard etch mask. AlN nanorod arrays are created by inductively coupled plasma dry etching of an AlN template. AlN facet recovery is performed by Metal Organic Vapor Phase Epitaxy regrowth. CL was used to assess the optical quality of the AlN nanorod.